SPE/ACS/ASM/AIChE Joint Technical Society Dinner Meeting
Block Copolymer Lithography: Where “Top Down” Meets “Bottom Up”

Prof. Thomas P. Russell, Silvio O. Conte Distinguished Professor of Polymer Science and Engineering, University of Massachusetts

NADA Center, Northwood University,
4000 Whiting Drive, Midland, MI 48640,
Phone: 989-837-4277

6.30 p.m., Thursday, May 15, 2008

As the size scale of device features becomes increasingly smaller, conventional lithographic processes become increasingly more difficult and expensive, especially at a minimum feature size of less than 50 nm. To achieve higher density circuits, storage devices or displays, alternative routes are needed to circumvent cost and manufacturing issues. An ideal process would be compatible with existing technological processes and manufacturing techniques, and these strategies, together with novel materials, could allow significant advances to be made in meeting both sort-term and long-term demands for higher density and faster devices. The self-assembly of block copolymers (BCP), two polymer chains covalently linked together at one end, provides a robust solution to these challenges. The integration of novel chemistries with the manipulation of self-assembly is giving rise to applications ranging from ultrahigh density storage devices to separations devices for virus particles. A few of these leading edge applications will be discussed to illustrate the continuing great potential of block copolymer technology.

Social 6:30 PM
Dinner 7:00 PM
Program 8:00 PM

$25.00 for SPE/ACS/ASM/AIChE members or guests, $15.00 for students

Reservations can be made via phone, fax, or e-mail to Dawn Wright at MMI. They must be received no later than Thursday, May 8, 2008. Phone: 989-832-5555, ext. 571, Fax: 989-832-5560, E-mail: wright@mmi.org